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Huang, Robert Y.S. Listings

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1 Huang, Robert Y.S. Experimental Investigation and Modeling of the Effects of High-dose Ion Implantation Damage on Boron Diffusion in Silicon
Ann Arbor UMI Dissertation Services 1996 Reprint Soft Cover Very Good 
Reprint of doctoral dissertation originally published in 1995. pp. xxiv, 132. Text is clean and unmarked. 
Price: 20.00 USD
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